国产麻豆精品

国产麻豆精品offers a broad uniform ion beam source for reactive processes, such as ion beam assist or ion beam deposition of highly controlled optical coatings.

• Supports wide range of operation: 50 to 1500eV and 75 to 700mA
• Reliable, uniform operation in both inert and oxidizing environments
• Water-cooled – For low-to-high power operation
• Optional four-grid design offers very high collimation
• Features the industry’s only filamentless RF Neutralizer, which provides low maintenance and enables long production runs
• Stable and efficient plasma operation allows precise control and high repeatability
• Well-suited to both batch and load-locked production processes